(Nanowerk News) Imec has developed a new method for the preferential deposition of silicon-germanium (SiGe) through chemical vapor deposition (CVD). They have further engineered this method into an ...
In the past decade, chemical-mechanical polishing (CMP) has emerged as the predominant planarization technique for shallow trench isolation (STI) and back end of the line (BEOL) metallization. To ...
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