Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

In VLSI layout design, density issues are critical factors influencing the performance, yield, and reliability of integrated circuits. This whitepaper delves into the several types of density issues, ...